Pixer Enables Technology For:
Mask Makers
- Tune your masks to meet required CD specifications and for optimal performance
- Yield improvement and fast turn-around on all mask types
- Achieve advanced CD Uniformity & MTT specifications
- Leverage existing installed mask manufacturing equipment
- Postpone purchasing additional advanced writing and etching tools
IC Manufacturers
- Improve your Lithography Process Window (PW) and overall productivity
- "Pellicle on" CD Uniformity improvement
- Extend the life of your installed base of scanners by improving the PW
- Improve yield on specific critical mask levels: dry and immersion lithography
- Improve chip binning: higher speed, lower leakage, etc.
Galileo Value Proposition – IC Manufacturers
- High sensitivity DUV metrology for early detection of haze at low CoO
- Detect progressive transmission degradation early to prevent CDU related yield loss
- Measures transmission degradation on all mask surfaces: frontside, backside of quartz, both sides of pellicle
- High speed scans: die-to-die or full field for coverage of scribelines
Galileo Value Proposition – Mask Makers
- High sensitivity DUV metrology for verification of haze returns
- Measures transmission degradation on all mask surfaces: frontside, backside of quartz, both sides of pellicle
- High speed scans: die-to-die or full field for coverage of scribelines
- Available as a stand-alone tool or as an option on the CDC200
Galileo Value Proposition – Mask Blank Manufacturers
- High sensitivity DUV transmission metrology with World Class TPT
- Measures quartz and MoSi coated blanks
- Enables blank grading by transmission uniformity