Pixer Enables Technology For:
Mask Makers
- Tune your masks to meet required CD specifications and for optimal performance
- Yield improvement and fast turn-around on all mask types
- Achieve advanced CD Uniformity & MTT specifications
- Leverage existing installed mask manufacturing equipment
- Postpone purchasing additional advanced writing and etching tools
IC Manufacturers
- Improve your Lithography Process Window (PW) and overall productivity
- "Pellicle on" CD Uniformity improvement
- Extend the life of your installed base of scanners by improving the PW
- Improve yield on specific critical mask levels: dry and immersion lithography
- Improve chip binning: higher speed, lower leakage, etc.
Currently available applications on Galileo:
Reticle Requalification
Reticle degradation due to the progressive growth of chemical contaminants, or “haze” on the mask and pellicle surfaces is a significant problem in DUV lithography. Traditional reticle inspection and wafer print techniques are insensitive to the early phases of haze growth, where a thin film of haze impacts the transmission uniformity, and therefore CD uniformity on the mask. Galileo’s high sensitivity, DUV transmission metrology captures this degradation while it is still a CD yield issue, long before defects impact yield. Galileo’s high speed of data acquisition also makes it the lowest CoO option for reticle requal.
Photomask Blank Grading
Shrinking geometries present a continuous challenge for IC Manufacturers. Mask blanks are a potential source of CD non-uniformity, as even 0.5% of transmission non-uniformity can consume 50% of the CDU budget in leading edge node. Galileo™ allows blank manufacturers to quickly and inexpensively sort blanks and MoSi coated blanks into high and standard transmission uniformity grades. With Galileo, mask customers can specify high uniformity blanks for critical layers, reducing the mask contribution to CDU.