Pixer Enables Technology For:
Mask Makers
- Tune your masks to meet required CD specifications and for optimal performance
- Yield improvement and fast turn-around on all mask types
- Achieve advanced CD Uniformity & MTT specifications
- Leverage existing installed mask manufacturing equipment
- Postpone purchasing additional advanced writing and etching tools
IC Manufacturers
- Improve your Lithography Process Window (PW) and overall productivity
- "Pellicle on" CD Uniformity improvement
- Extend the life of your installed base of scanners by improving the PW
- Improve yield on specific critical mask levels: dry and immersion lithography
- Improve chip binning: higher speed, lower leakage, etc.
Pixer CDC200 - CD Control Tool For Mask and Lithography Applications
Pixer’s CDC200 is the industry’s first on-the-fly, integrated solution for high-resolution Critical Dimension Control (CDC), enabling both Mask Makers and IC Manufacturers to control local CDs (Critical Dimensions), as well as significantly improve upon global and local CD Uniformity across masks and wafers during lithographic operations.
The picture below explains the CD Uniformity challenge. In order to achieve high Litho productivity, all CDs of a specific type, should be resolved of the same size, so the Litho Process Window is maximized
In practice, however, this is not the case as statistically some of the CDs are slightly off-target, while others are completely out of the allowed error budget (typically +/-10% of the required CD target).
Pixer’s CDC200 offers a solution to the above described challenge, by introducing shading elements into the Mask. The shading elements affect the Mask attenuation which translates into change in CD on the wafer. By measuring the CD dimension before the correction, and by applying a relevant correction, the right attenuation is achieved, that shifts the wafer CD to its correct value. This process described in the picture below.
