PMJ 2008 Paper
Pixer Technology and Carl Zeiss
Mask CD Control Using AIMS as the CD Metrology Data Source
Manuscript download (pdf 700 KB)
EMLC/PMJ 2008
EMLC Best Poster
Galileo Poster
Very High Sensitivity Mask Transmittance Mapping and Measurements Based on Non Imaging Optics with Galileo™
Manuscript download (pdf 2.3 mb)
BACUS 2007
Qimonda, Pixer, AMTC
Performance Comparison of Techniques for Intra-field CDC Control Improvement
Manuscript download (pdf 450 KB)
BACUS 2007
Pixer, Carl Zeiss
Mask CD Control with Ultrafast Laser for Improving Mask CDU Using AIMS™ as the CD Metrology Data Source
Manuscript download (pdf 608 KB)
Microlithography World - February 2007
Correcting ACLV by mask substrate tuning
Gidi Gottlieb, Erez Graitzer, Guy Ben-Zvi, Bill Turnquist, Pixer Technology, Karmiel, Israel
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EMLC 2007
Pixer Technology, Karmiel, Israel
The Effect of Intra-field CD Uniformity Control (CDC) on Mask Birefringence
Manuscript download (pdf 650 KB)
Semicon Japan 2006
Pixer Technology, Karmiel Israel
Introduction to Mask and Wafer Intrafield Critical Dimension control (CDC) using ultrafast laser
Manuscript download (pdf 660 KB)
Presentation Download (pdf 1.2 MB)
Photomask Japan (PMJ) 2006
ULCT Ltd., Karmiel, Israel and Infineon Technologies, Dresden, Germany
Irradiation resistance of intravolume shading elements embedded in photomasks used for CD uniformity control by local intra-field transmission attenuation
Manuscript Download (pdf 750 KB)
Presentation Download (ppt 1MB)
Photomask Japan (PMJ) 2006
DNP Co. Ltd. Japan and UCLT Ltd., Israel
In-field CD uniformity control by altering transmission distribution of the photomask, using ultra-fast pulsed laser technology
Manuscript Download (pdf 450 KB)
Semiconductor International - April 2006 - Web Exclusive
CD Control Inside the Bulk of Photomasks
Eitan Zait, Sergey Oshemkov, Vladimir Dmitriev and Guy Ben-Zvi, UCLT Ltd., Karmiel, Israel
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SPIE Microlithography 2006
CD variations correction by local transmission control of photomasks done with a novel laser based process.
Paper Download (pdf 336 KB)
SPIE Microlithography 2006
Improvement of shot uniformity on the wafer by controlling transmittance distribution of a photomask using laser abstract
Abstract Download (pdf 436 KB)
SPIE Microlithography 2006
Photomask Clear Defects Repair Using Ultrafast Laser Technology
Paper Download (pdf 170 KB)