News

Pixer Technology announces Galileo for early reticle haze detection

April 14, 2008

Silicon Valley, California – April 14, 2008 — Pixer Technology Inc. (Pixer), a provider of Revolutionary Lithography Solutions for the semiconductor manufacturing industry, announced the utilization of it’s recently released Galileo™ system for early reticle haze detection.

In addition to being the industry’s first high speed, high-resolution DUV transmission metrology tool, Galileo has the ability to protect litho yields as a reticle requalification tool. Galileo has demonstrated its ability to detect haze-related transmission loss, while it is still a CD uniformity problem, rather than waiting for a defect-related yield crash. Galileo provides fabs a low cost of ownership, with typical reticle scan times of under an hour, and the ability to measure both single and multi-die reticles.

“In the past, traditional mask inspection methods identified haze only once it become a defect problem, resulting in CD yield declines,” said Steven Labovitz, Director of Strategic Marketing. “With Galileo, our customers are seeing an increase in their CD yields with the system’s ability to detect transmission degradation, due to haze, earlier in the manufacturing process.”

About Pixer Technology Ltd.
Pixer is a supplier of semiconductor capital equipment headquartered in Karmiel, Israel. It provides IC manufacturers and mask makers with solutions to correct, improve and selectively optimize the photolithography masks that are used in advanced semiconductor manufacturing processes. Pixer offers a unique revolutionary solution for improving the uniformity of Critical Dimensions on the mask, addressing one of the industry’s critical requirements for advanced chip manufacturing down to the 32 nm node and beyond.

Pixer Contact:
Mr. Bill Turnquist
VP, Sales and Marketing
Tel: 1-510-207-8937
Email: Bill@Pixertech.com

Mr. Ken Roberts
F23, Inc.
Tel: 1-925-256-8872
Email: kroberts@f23.com