News

Pixer Technology announces its new CDC200™ and Galileo™ systems

February 13, 2008

Silicon Valley, California - February 18, 2007 — Pixer Technology Inc. (Pixer), a provider of Revolutionary Lithography Solutions for the semiconductor manufacturing industry, announces two new tools to be introduced at SPIE Advanced Lithography in San Jose. Pixer Technology introduces the CDC200^™, the next generation of our high-resolution Critical Dimension Control (CDC) solution. The CDC200 enables both mask makers and IC manufacturers to control their Critical Dimensions and significantly improve global and local CD uniformity across masks and wafers. These improvements are achieved through the selective modification of the mask transmission profile with partially scattering Shade-In Elements^™.

“Our new CDC200 is enabling the ITRS Roadmap CD uniformity requirements for 45nm and 32nm today. Our customers are realizing world-class CD uniformity, with substantial improvements in EOL yield,” said Steven Labovitz, director of strategic marketing at Pixer. “The CDC200 improves on the CDC101^™, providing a more robust production process in a smaller footprint.”

Pixer is also introducing Galileo, the industry’s first high speed, high resolution DUV metrology tool. Galileo, enables measurement of DUV transmission with a better than 0.1% resolution. Measurements can be made on both quartz and MoSi coated blanks. Of course, sensitivity does not come at the expense of speed: over 1000 sample points can be measured in under 20 minutes.

“With Galileo, we expect that blank manufacturers will be able to provide a higher quality mask blank to their leading-edge customers,” said Labovitz. “As photomask consumers push towards 45nm process nodes, transmission non-uniformity in the mask blank can account for up to 40% of the CD uniformity budget. Galileo will enable fabs to specify high uniformity blanks.”

About Pixer Technology Ltd.

Pixer is a supplier of semiconductor capital equipment headquartered in Karmiel, Israel. It provides IC manufacturers and mask makers with solutions to correct, improve and selectively optimize the photolithography masks that are used in advanced semiconductor manufacturing processes. Pixer offers a unique revolutionary solution for improving the uniformity of Critical Dimensions on the mask, addressing one of the industry’s critical requirements for advanced chip manufacturing down to the 32 nm node and beyond.

Contact:
Mr. Bill Turnquist
VP, Sales and Marketing
Pixer Technology
Tel: 1-510-207-8937
Click here to send an email
www.pixertech.com